# SPIE Photomask Technology + Extreme Ultraviolet Lithography

- Dates: 8 September 2026 to 11 September 2026
- Location: Monterey Conference Center, Monterey, United States
- Organiser: SPIE
- Industry: Manufacturing

## About

Photo Mask Technology Exhibition. SPIE Photomask Technology + Extreme Ultraviolet Lithography is a highly regarded exhibition & conference for buyers and key suppliers of components, software, and manufacturing equipment for the mask industry.

## Who attends

Experts from across the photomask and semiconductor industries come together to explore the latest innovations in mask technology, EUV lithography, and advanced manufacturing.

_As described by the organiser._

## Official links

- [Official website](https://tsi.com/discover-tsi/events/conferences/2026-spie-photomask-technology-extreme-ultraviolet-lithography)
- [Registration](https://tsi.com/register-a-product)

## Topics

- Solutions for Advanced Semiconductor Manufacturing

## Where to stay

- **Monterey Hotel**: 50 m from the venue, 406 Alvarado Street, Monterey, 93940
  - [Hotel website](https://www.montereyhotel.com/)
- **Monterey Marriott**: 70 m from the venue
- **Portola Hotel**: 150 m from the venue, Two Portola Plaza, Monterey, 93940
  - [Hotel website](https://portolahotel.com)
- **Hotel Pacific**: 220 m from the venue
- **Stevenson Hotel Monterey**: 530 m from the venue
- **Casa Munras Garden Hotel & Spa**: 540 m from the venue
- **Colton Inn**: 590 m from the venue, 707 Pacific Street, Monterey, 93940
- **Hotel Abrego**: 660 m from the venue

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Source: https://www.luminik.io/events/spie-photomask-technology-extreme-ultraviolet-lithography-monterey/